Apparatus and method for projection exposure

摘要: A projection exposure apparatus is able to monitor changes in transmissivity of the optical system so as provide a high degree control over illuminance produce precision printing circuit patterns on substrate. referencing member, having reference marks and window section for determining transmitting beam, provided sample stage During scanning/exposure process, any positional deviation checked by alignment comparing reticle with illuminated beams. Simultaneously, light passing through determine if there change transmission coefficient system, illumination power adjusted near real-time compensation system.