Substrate support device

作者: Jun Futakuchiya , Junichi Miyahara , Daisuke Hashimoto

DOI:

关键词:

摘要: A substrate support device formed of a metal and having high withstand voltage thermal resistance is provided. according to the present invention includes plate section metal; shaft connected heating element provided in section; an insulating film on first surface section, opposite by ceramic spraying. The may further include second which intersects approximately perpendicularly.

参考文章(71)
Katsuhito Yoshida, Tatsuo Nagai, Norihito Ikemiya, Shigeru Yoshida, Diamond electrode and method for manufacturing diamond electrode ,(2009)
Shingo Kadomura, Kei Takatsu, Shinsuke Hirano, Apparatus for processing glass substrate ,(1999)
Wataru Okase, Substrate treatment system ,(1998)
Gwo-Chuan Tzu, Xiaoxiong Yuan, David T. Or, Xinliang Lu, Chien-Teh Kao, Mei Chang, Jing-Pei Chou, Salvador P. Umotoy, Yu Chang, See-Eng Phan, William Kuang, An in-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber ,(2005)
Masato Horiguchi, Chikako Takahashi, Takashi Yamamoto, Takashi Suzuki, Electrode assembly and plasma processing apparatus ,(2012)
Masuhiro Natsuhara, Katsuhiro Itakura, Tomoyuki Awazu, Hirohiko Nakata, Wafer holder for wafer prober and wafer prober equipped with same ,(2005)
Richard E. Demaray, Adherent ceramic coatings ,(1985)
Juan Carlos Rocha-Alvarez, Lipyeow Yap, Dale R. Du Bois, Thomas Nowak, Tuan Anh Nguyen, Sanjeev Baluja, Jianhua Zhou, Multifunctional heater/chiller pedestal for wide range wafer temperature control ,(2009)