High-temperature oxidation behavior of nanocrystalline diamond films
作者： Jui-Chen Pu , Sea-Fue Wang , James C. Sung
DOI: 10.1016/J.JALLCOM.2009.09.140
关键词:
摘要: Abstract In this study, high-temperature stability of nanocrystalline diamond films prepared by hot filament chemical vapor deposition (HFCVD) was investigated through differential thermal analysis/thermal gravimetric analysis (DTA/TGA), analyses, visible and UV Raman analysis, XPS analysis. Nanocrystalline with crystalline size about 25 nm were obtained, which possess high density grain boundaries a sp 2 -bonding non-diamond carbon. the initial stage oxidation, carbon graphite phase preferentially etched away oxygen, carries on faster rate. Then, slower oxidation rate continued reacting atoms in rigid structure oxygen. The activation energies for former latter, calculated from are 195 217 kJ/mol, respectively. Both results in-situ spectra indicate that significantly decreased increasing temperature soaking time.
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