作者: Jae-Won Eom , Chan-Ki Kim , Do-Young Lee , Ki-Nam Park , Kang-Jin Lee
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摘要: A method for fabricating a color image sensor scanning and converting an optical into electrical signals, includes the steps of: (a) forming P-type semiconductor layer on substrate; (b) field oxide layers to define regions red, green blue photodiodes; (c) providing ion implantation mask having different patterns (d) implanting impurity ions through use of said form N-type diffusion in layer; (e) applying thermal process resulting structure first, second third depletion corresponding photodiodes.