Point Island Models for Nucleation and Growth of Supported Nanoclusters during Surface Deposition

摘要: Point island models (PIMs) are presented for the formation of supported nanoclusters (or islands) during deposition on flat crystalline substrates at lower submonolayer coverages. These treat islands as occupying a single adsorption site, although carrying label to track their size (i.e., they suppress structure). However, particularly effective in describing and spatial distributions. In fact, these PIMs provide fundamental insight into key features homogeneous nucleation growth processes surfaces. also versatile being readily adapted both diffusion-limited attachment-limited growth, variety other with modified mechanisms. Their behavior is precisely assessed by kinetic Monte Carlo simulation.