作者: Masato Takeuchi , Junichi Deguchi , Shiro Sakai , Masakazu Anpo
DOI: 10.1016/J.APCATB.2010.02.024
关键词:
摘要: Abstract The effect of H2O vapor addition on the photocatalytic oxidation ethanol, acetaldehyde and acetic acid TiO2 semiconductor powders under UV light irradiation were investigated. surfaces was enhanced by vapor, its extent depending pressure while, other hand, ethanol depressed coexistence with vapor. Since Ti4+ sites work as trap for photo-formed electrons, carbonyl compounds strongly adsorbed are not directly oxidized holes. However, when optimal amounts molecules exist in reaction system, OH radicals formed photo-oxidation indirectly oxidize such organic species sites. In contrast, although promptly interact holes hydroxyl groups, system lessens efficient interaction between groups surfaces, resulting a suppression reactivity. this way, correlation different surface sites, or which adsorb carriers trapped, is clearly understood but observed to play an important role various presence absence