摘要: Abstract The epitaxial growth of GaN by vapor phase reaction between GaCl and NH 3 in a He carrier gas ancient is described. Single crystal layers 100–200 ωm thick ∼ 1 cm 2 area, were obtained on (0001) oriented sapphire substrates at deposition temperatures near 1050 °C. best undoped grown had concentrations 1–2 × 10 17 −3 with electron mobilities 400 /V sec 300 K.