Vapor epitaxy of gallium nitride

作者: M Ilegems

DOI: 10.1016/0022-0248(72)90184-4

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摘要: Abstract The epitaxial growth of GaN by vapor phase reaction between GaCl and NH 3 in a He carrier gas ancient is described. Single crystal layers 100–200 ωm thick ∼ 1 cm 2 area, were obtained on (0001) oriented sapphire substrates at deposition temperatures near 1050 °C. best undoped grown had concentrations 1–2 × 10 17 −3 with electron mobilities 400 /V sec 300 K.

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