Optimizing stereolithography throughput

作者: Diane A Schaub , Kou-Rey Chu , Douglas C Montgomery , None

DOI: 10.1016/S0278-6125(97)89099-1

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摘要: The stereolithography (SL) process, although a relatively new technology, has revolutionized the domain of part and process research development.1–3 SL is used to produce parts for various purposes throughout aerospace, automotive, electronics, biomedical products industries, as well many others. applications include design verification models, methods tool development casting marketing aids. Its success in myriad unfortunately often resulted production backlog machines. In addition, because technology new, technological improvements have occurred quickly involve such drastic changes, most client companies are using suboptimized ways, resulting less than maximum throughput with nonpeak geometric physical properties. A systematic but efficient use experimental can help more advance up learning curve increase their parts. This be done little testing, payback worth money time invested.

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