Method of making and accessing split gate memory device

作者: Kuo-Tung Chang , Lee Z. Wang , Craig Swift , Wei-Ming Chen

DOI:

关键词:

摘要: A non-volatile memory having a control gate (14) and sidewall select (28) is illustrated. The formed in conjunction with semiconductor doped oxide (20) to form cell (7). element used dope the layer will generally include silicon or germanium. (7) programmed by storing electrons (20), erased using band-to-band tunneling.

参考文章(10)
Kuo-Tung Chang, Ko-Min Chang, Cross-point eeprom memory array ,(1994)
Yukinobu Murao, Hirohiko Yamamoto, Masanori Kikuchi, Ti Silicidation Technology for High Speed EPROM Devices symposium on vlsi technology. pp. 112- 113 ,(1983)
Zahra Hadjizadeh-Amini, Hsingya A. Wang, James J. Hsu, Lewis Shen, Method of forming and removing polysilicon lightly doped drain spacers ,(1989)
H.I. Hanafi, S. Tiwari, I. Khan, Fast and long retention-time nano-crystal memory IEEE Transactions on Electron Devices. ,vol. 43, pp. 1553- 1558 ,(1996) , 10.1109/16.535349
Mohammed Anjum, Ibrahim K. Burki, Craig W. Christian, Method for forming a silicide using ion beam mixing ,(1994)
James R. Pfiester, John R. Alvis, Orin W. Holland, N-channel MOS transistors having source/drain regions with germanium ,(1987)