Surface Analysis Techniques Related to AES and XPS

作者: Siegfried Hofmann

DOI: 10.1007/978-3-642-27381-0_10

关键词:

摘要: Any analysis technique will provide a given characteristic property of surface, such as atomic composition, chemical states, structural topography, or electronic states. The considerable refinement measurement techniques in the past three decades, all these characteristics surfaces and interfaces can be analyzed using an abundant variety methods. All methods used for surface studies (together with method variants probably more than 50) cannot comprehensively treated here.

参考文章(75)
M.P Seah, I.S Gilmore, S.J Spencer, Quantitative XPS: I. Analysis of X-ray photoelectron intensities from elemental data in a digital photoelectron database Journal of Electron Spectroscopy and Related Phenomena. ,vol. 120, pp. 93- 111 ,(2001) , 10.1016/S0368-2048(01)00311-5
F. J. Humphreys, Review Grain and subgrain characterisation by electron backscatter diffraction Journal of Materials Science. ,vol. 36, pp. 3833- 3854 ,(2001) , 10.1023/A:1017973432592
Jean Claude Rivière, Surface Analytical Techniques ,(1990)
R. Payling, Thomas Nelis, Glow discharge optical emission spectroscopy : a practical guide Royal Society of Chemistry. ,(2003)
J. C. Vickerman, D. Briggs, ToF-SIMS : surface analysis by mass spectrometry IM. ,(2001)
J. M. Walls, Methods of surface analysis : techniques and applications Cambridge University Press. ,(1990)
A. Benninghoven, Secondary ion mass spectrometry Wiley. ,(1990)