Water soluble polymer and photoresist composition containing the same

摘要: The present invention provides a water soluble polymer which is prepared by the following steps. First, carboxyl group-containing reacted with an alkaline reagent so that portion of groups are in amount sufficient to make soluble. Then, obtained epoxide containing unsaturated bonds and/or heteroatoms 1 100 mole percent remaining form ester via ring-opening reaction epoxides, wherein heteroatom can be silicon, nitrogen, phosphorus or sulfur. used as photosensitive resin. When photoresist composition for preparing printed ciruit boards, it exhibits high photosensitivity, good dispersability, storage stability, and adhesion copper. In addition, problem sticking mask prevented.