Acid-diffusion behaviour in organic thin films and its effect on patterning
作者： Jin-Kyun Lee , Margarita Chatzichristidi , Alexander A Zakhidov , Ha Soo Hwang , Evan L Schwartz
DOI: 10.1039/B817286B
关键词:
摘要: Acid and its formation placement is one of the most important aspects in chemically amplified photolithographic process. The choice photoacid generator (PAG) patterning acidic substrates, such as PEDOT:PSS, has consequences for resolution overall quality patterned image. In this study, an acid exchange diffusion mechanism proposed undesired decomposition unexposed photoresist layer containing ionic PAGs. use non-ionic PAGs been shown to be a solution problem. addition, nature PEDOT:PSS substrate employed produce images cross-linkable light-emitting polymer. With further optimization development, potentially fast simple method introduce patterns various organic electronic devices.
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