作者: K. Li , K. Morton , T. Veres , B. Cui
DOI: 10.1016/B978-0-08-088504-9.00497-9
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摘要: Due to its high resolution, throughput, and low cost, nanoimprint lithography (NIL) variations are considered the most promising lithographic techniques for high-volume manufacturing of nanoscale devices. Compared nanostructures fabricated by chemical synthesis self-assembly, those nanolithography thin-film technology offer precise control structures’ shape, size, positioning on a substrate. In this article we will focus two application areas nanofabrication using NIL. The first one is in field biosensing covers nanostructured plasmonic biosensors, nonplasmonic biosensors such as based photonic crystals, electrical or electrochemical nanoelectromechanical systems. majority detect biobinding events including DNA hybridization antibody–antigen binding; with remainder fingerprint target biomolecules labeling molecule an attached particle. Fabrication micro- nano-fluidics NIL biomedical applications also be introduced briefly. second area tissue engineering mainly contact guidance cells cultured substrates.