High temperature indentation of helium-implanted tungsten
作者： James SK-L Gibson , Steve G Roberts , David EJ Armstrong , None
DOI: 10.1016/J.MSEA.2014.12.034
关键词:
摘要: Abstract Nanoindentation has been performed on tungsten, unimplanted and helium-implanted to ~600 appm, at temperatures up 750 °C. The hardening effect of the damage was 0.90 GPa 50 °C, but is negligible above 450 °C. hardness value a given temperature did not change re-testing after heating This suggests that helium trapped in small vacancy complexes are stable least 750 °C, which can be bypassed due increased dislocation mobility (cross slip or climb)
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