作者: Byung-Jin Choi , Vikramjit Singh , Sidlgata V. Sreenivasan , Frank Y. Xu
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摘要: Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates molds that subsequently replicate nano-shaped patterns into other substrates, such as a functional sacrificial resist form nanoparticles.