Pentacene ultrathin film formation on reduced and oxidized Si surfaces
作者： Ricardo Ruiz , Bert Nickel , Norbert Koch , Leonard C. Feldman , Richard F. Haglund
DOI: 10.1103/PHYSREVB.67.125406
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摘要: We have compared the nucleation of pentacene on reduced and oxidized Si surfaces by a combination x-ray reflectivity measurements atomic force microscopy. For surface, density is 0.007 μm - 2 . Second monolayer (ML) formation starts at coverage Θ=0.6 ML, first layer completely closed total ML. larger factor 100 (0.7 ). ML also but closes already 1.1 coverage, indicating nearly ideal layer-by-layer growth. both terminations, electron obtained for only 75% bulk value, mass packing efficiency layer. islands are aligned relative to each other an area limited lateral size islands, which act as templates epitaxial
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