Influence of Deposition Temperatures on Bonding State and Microstructure of Carbon Nitride Thin Films Prepared by Ion-Beam-Assisted Deposition

摘要: The influences of the deposition temperature on bonding states and microstructures carbon nitride films prepared by ion-beam-assisted are analyzed Fourier-transform infrared spectroscopy (FT-IR), X-ray photoelectron (XPS), Raman transmission electron microscopy (TEM). FT-IR absorption spectra exhibit a peak corresponding to C≡N bond its population decreases with temperature. N 1s peaks in XPS indicate existence two different states, one attributed nitrogen inserted into graphitic ring structure, other surrounded three carbons C–N network. increase leads formation cluster similar highly disordered turbostratic structure. In film growth, however, sequential phase transformation from sp2-bonded phases sp3-bonded frequently observed BN is not found TEM analyses.