UMOS transistors on

作者: E.S. Ammar , T.J. Rodgers

DOI: 10.1109/T-ED.1980.19955

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参考文章(7)
T.J. Rodgers, S. Asai, M.D. Pocha, R.W. Dutton, J.D. Meindl, An experimental and theoretical analysis of double-diffused MOS transistors IEEE Journal of Solid-State Circuits. ,vol. 10, pp. 322- 331 ,(1975) , 10.1109/JSSC.1975.1050618
K.E. Bean, Anisotropic etching of silicon IEEE Transactions on Electron Devices. ,vol. 25, pp. 1185- 1193 ,(1978) , 10.1109/T-ED.1978.19250
Don L. Kendall, On etching very narrow grooves in silicon Applied Physics Letters. ,vol. 26, pp. 195- 198 ,(1975) , 10.1063/1.88113
D. B. Lee, Anisotropic Etching of Silicon Journal of Applied Physics. ,vol. 40, pp. 4569- 4574 ,(1969) , 10.1063/1.1657233
T.J. Rodgers, W.R. Hiltpold, B. Frederick, J.J. Barnes, F.B. Jenne, J.D. Trotter, VMOS memory technology IEEE Journal of Solid-State Circuits. ,vol. 12, pp. 515- 524 ,(1977) , 10.1109/JSSC.1977.1050945
R.H. Dennard, F.H. Gaensslen, Hwa-Nien Yu, V.L. Rideout, E. Bassous, A.R. LeBlanc, Design of ion-implanted MOSFET's with very small physical dimensions IEEE Journal of Solid-State Circuits. ,vol. 9, pp. 256- 268 ,(1974) , 10.1109/JSSC.1974.1050511
R. Hiltpold, G. Marr, J.W. Zimmer, J.D. Trotter, T.J. Rodgers, VMOS ROM IEEE Journal of Solid-state Circuits. ,(1976)