Quantitative phase-mode electrostatic force microscopy on silicon oxide nanostructures.

摘要: Phase-mode electrostatic force microscopy (EFM-Phase) is a viable technique to image surface potential of silicon oxide stripes fabricated by oxidation scanning probe lithography, exhibiting an inhomogeneous distribution localized charges trapped within the during electrochemical reaction. We show here that these nanopatterns are useful benchmark samples for assessing spatial/voltage resolution EFM-phase. To quantitatively extract relevant observables, we developed and applied analytical model interactions in which tip modelled prolate spheroidal coordinates system, fitting accurately experimental data. A lateral ∼60 nm, comparable EFM experiments reported literature, charge ∼20 electrons achieved. This analysis evidences presence bimodal population nanopatterned stripes.