Aspects of a novel method for the pore size analysis of thin silica films based on krypton adsorption at liquid argon temperature (87.3K)

作者: Matthias Thommes , Norikazu Nishiyama , Shunsuke Tanaka

DOI: 10.1016/S0167-2991(07)80382-X

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摘要: The adsorption and phase behavior of krypton at 87.3 K (i.e. 28.5 below krypton's triple point temperature) has been systematically studied as a function pore size by using series micro- mesoporous molecular sieves. Our results indicate that condensation cannot be observed for diameters > 10 nm, but occurs in smaller mesopores. An important result is further the density confined corresponds to supercooled liquid krypton, which applying analysis. We used our systematic studies develop method characterization thin micro/mesoporous silica films based on argon temperature (87.3 K). This allows determining distribution diameter range from < 1 ∼ 9 nm.

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