作者: I. Barnes , V. Bastian , K. H. Becker , E. H. Fink
DOI: 10.1007/978-94-009-6505-8_16
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摘要: Rate constants for the reactions of OH radicals with H2S, CH3SH, CH3SCH3 and. thiophene in presence various partial pressures O2 at 700 Torr total pressure N2 diluent have been measured 38 1 and 420 reaction Chambers using competitive kinetic techniques. For CH3SH rate were found to increase increasing O2. In case H2S showed no dependence on present system. The O2-dependence witn is discussed terms a mechanism involving addition form complex which can react or decompose back reactants. Possible pathways + are also results data available from literature.