In situ monitoring of electrical resistance of nanoferrite thin film irradiated by 190 MeV Au14+ ions

作者: Sanjukta Ghosh , P. Ayyub , N. Kumar , S.A. Khan , D. Banerjee

DOI: 10.1016/S0168-583X(03)01839-1

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摘要: Abstract A highly resistive nanocrystalline thin film of Li0.25Mg0.5Mn0.1Fe2.15O4, deposited by RF magnetron sputtering technique on Si(1 0 0) substrate, is irradiated with 190 MeV Au14+ ions. To probe the swift heavy ion induced modifications in electrical properties an situ measurement resistance using two-probe method carried out. We observe value resistivity comes down drastically from 1.5 × 108 to 1 × 105 Ω cm after irradiation at fluence 1 × 1013 ions/cm2. In XRD spectra no previous spinel peaks are observed. No loss oxygen content have presented observed phenomenon as effect formation amorphized latent tracks basis thermal spike model.

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