作者: Cheng-Ying Li , Chun-Cheng Lin , Sheng-Yuan Chu , Jun-Ting Lin , Chih-Yu Huang
DOI: 10.1063/1.5140027
关键词:
摘要: Nb-doped ZnO (NbxZn1−xO, NZO) thin films with various Nb additions (x = 0, 0.2, 0.5, and 0.8 at. %) were deposited on Pt/TiO2/SiO2/Si substrates by radio frequency magnetron sputtering. The doping concentration was found to affect the microstructure, number of oxygen vacancies, work function Pt/NZO/Pt structures. Among devices, film 0.5 at. % addition showed a better switching-voltage stability [i.e., optimal coefficient variation (Cv) for reset (7.02%) set (2.73%) operations, respectively], high endurance (∼1000 cycles), lower (0.57 V) (1.83 V) voltages due larger vacancies function. In general, results show that present NZO are promising candidates stable low power-consumption resistive random access memory applications.