Local bonding arrangements of boron in doped hydrogenated amorphous silicon

作者: S. G. Greenbaum , W. E. Carlos , P. C. Taylor

DOI: 10.1063/1.334203

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摘要: Analysis of boron‐11 NMR linewidths in films boron‐doped hydrogenated amorphous silicon yields structural information concerning coordination and nearest‐neighbor bonding the dopant atoms. A heavily doped (10 at. %, B) film exhibits two distinct boron sites, both them being threefold coordinated. second sample containing 0.7 at.% B shows only one site, also Annealing studies latter suggest formation B‐Si bonds as hydrogen is driven off. The 11B linewidth a compensated (containing % 0.6 P) comparable to that uncompensated sample. spin‐spin relaxation (T2) measurements indicate sites are clustered all three materials.

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