Tribological and electrical properties of metal‐containing hydrogenated carbon films

作者: H. Dimigen , H. Hübsch , R. Memming

DOI: 10.1063/1.97968

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摘要: The formation of metal‐containing amorphous hydrogenated carbon films (a‐C:H) in a reactive sputtering process is reported. layers were prepared at room temperature using various metals different concentrations. According to tribological measurements the exhibit small friction values and an extremely low abrasive wear rate. electrical conductivity depends on metal concentration could be varied over many orders magnitude.