Micro-patterning of light guide panel in a LCD-BLU by using on silicon crystals

摘要: Luminous efficiency and uniformity in a LCD-BLU are mainly determined by fine scattering patterns formed on the light guide panel. We propose novel fabrication method of 3-dimensional scattered based anisotropic etching silicon wafers. Micro-pyramid with 70.5 degree apex-angle micro-prism 109.4 can be self-constructed wet, (100) (110) wafers, respectively, those easily duplicated PDMS replica process. Experimental results spatial angular distributions irradiation from panel micro-pyramid were very consistent calculation results. Surface roughness silicon-based micro-patterns is free any artificial defects since inherently crystal surfaces. Therefore, we expect that micro-patterning process makes it possible to fabricate perfect micro-structures surface apex angles, which may guarantee mass-reproduction panels LCD-BLU.