Analysis of the structural properties of polycrystalline silicon germanium films
作者： S. Sedky , P. Fiorini , S. Loreti , M. Caymax , K. Baert
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摘要: In this work, poly SiGe is proposed as a suitable material for surface micromachining applications that require low thermal budget. The effect of the deposition conditions and layer thickness on structural mechanical properties analyzed by means transmission electron microscopy (TEM) X-ray diffraction spectroscopy (XRD). It demonstrated using as-grown (deposited at 625/spl deg/C), tensile stress (+60 MPa) negligible gradient can be achieved.
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