Decomposition of Trichlorotrifluoroethane by Microwave‐Induced Ar Plasma Generated from SiC Ceramics under Atmospheric Pressure

摘要: Behavior of microwave‐induced (MI) Ar plasma generated from SiC ceramics in flowing containing trichlorotrifluoroethane (CFC113) and the decomposition CFC113 by MI plasmas have been investigated systematically at atmospheric pressure. The can be even CFC113, , pressure, irrespective continuous or pulsed microwave irradiation. length streak was shortened top broadened, especially addition . an appropriate amount indispensable for complete oxidation C atoms CFC113. It is confirmed that offer several advantages decomposing as compared to thermal decomposition, with respect energy consumption, oxidation, concentration residual partial products. © 1999 Electrochemical Society. All rights reserved.