Fourier Analysis of Interference Structure in X-Ray Specular Reflection from Thin Films

摘要: Interference oscillation observed in X-ray total external reflection from thin films was analyzed by the Fourier transform algorithm. The peak position space good agreement with layer thickness, and determined independently surface/interface roughness. principle of present technique its application to SiO2/Si are shown. advantages experiments using tunable synchrotron X-rays also discussed.