作者: Yung-Chi Lin , Jenq-Gong Duh
DOI: 10.1007/S11664-006-0215-9
关键词:
摘要: Nickel plating has been used as the under bump metallization (UBM) in microelectronics industry. The electroplated Ni-P UBM with different phosphorous contents (7 wt.%, 10 and 13 wt.%) was to evaluate interfacial reaction between Sn-3Ag-0.5Cu solder paste during multiple reflow. (Cu,Ni)6Sn5 intermetallic compounds (IMC) formed SnAgCu solder/Ni-P interface after first For three times reflow, (Ni,Cu)3Sn4 IMC formed, while spalled into matrix. With further increasing cycles of Ni-Sn-P layer for Ni-10wt.%P Ni-13wt.%P UBM. However, almost no revealed Ni-7wt.%P even ten In consideration wettability UBM, SnAgCu/Ni-P, dissolution optimal selection proposed also discussed.