Method for avoiding interference in a CMOS sensor
作者： Jui-Hsiang Pan
DOI:
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摘要: A method for avoiding interference in a CMOS sensor. substrate at least comprising sensor, an interconnect layer and inter-layer dielectric thereon is provided. passivation formed over the substrate. photolithography etching process performed to remove part of above sensor region The thus exposed. An oxide on exposed region. micro-lens layer.
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