Sub-nanoscale nanoimprint fabrication of atomically stepped glassy substrates of silicate glass and acryl polymer
作者： Mamoru Yoshimoto
DOI: 10.1007/S00339-015-9247-4
关键词:
摘要: In the nanoimprint process, resolution limit of patterning has attracted much attention from both scientific and industrial aspects. this article, we briefly review main achievements our research group on sub-nanoscale fabrication atomically patterned glassy substrates oxide glass polymer. By applying sapphire (α-Al2O3 single crystal) wafers with self-organized nanopatterns atomic steps as thermal nanoimprinting molds, successfully transferred their nanoscale patterns onto surfaces such soda-lime silicate glasses poly(methyl methacrylate) polymers. The nanoimprinted materials exhibited regularly arrayed stairs 0.2–0.3 nm step height, which were in good agreement sub-nanopatterns molds. These stepped morphologies found to be stable for about 1 year.
springer.com
harvard.edu
sci-hub.se 参考文章(31)
Mamoru Yoshimoto, Kenji Yoshida, Hideaki Maruta, Yoshiko Hishitani, Hideomi Koinuma, Shigeru Nishio, Masato Kakihana, Takeshi Tachibana, Epitaxial diamond growth on sapphire in an oxidizing environment Nature. ,vol. 399, pp. 340- 342 ,(1999) , 10.1038/20653
S. W. Pang, Direct nano-printing on Al substrate using a SiC mold Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 16, pp. 1145- 1149 ,(1998) , 10.1116/1.590024
Yasuyuki Akita, Takahiro Watanabe, Wakana Hara, Akifumi Matsuda, Mamoru Yoshimoto, Atomically Stepped Glass Surface Formed by Nanoimprint Japanese Journal of Applied Physics. ,vol. 46, pp. L342- L344 ,(2007) , 10.1143/JJAP.46.L342
Y. Hirai, K. Kanakugi, T. Yamaguchi, K. Yao, S. Kitagawa, Y. Tanaka, Fine pattern fabrication on glass surface by imprint lithography Microelectronic Engineering. ,vol. 67, pp. 237- 244 ,(2003) , 10.1016/S0167-9317(03)00077-7
Hirokazu Oda, Tomoyuki Ohtake, Toshiaki Takaoka, Masaru Nakagawa, Photoreactive Chemisorbed Monolayer Suppressing Polymer Dewetting in Thermal Nanoimprint Lithography Langmuir. ,vol. 25, pp. 6604- 6606 ,(2009) , 10.1021/LA900902F
Neerja Saran, Kunjal Parikh, Dong-Seok Suh, Edgar Muñoz, Harsha Kolla, Sanjeev K. Manohar, Fabrication and Characterization of Thin Films of Single-Walled Carbon Nanotube Bundles on Flexible Plastic Substrates Journal of the American Chemical Society. ,vol. 126, pp. 4462- 4463 ,(2004) , 10.1021/JA037273P
Atsushi Sasaki, Wakana Hara, Akifumi Matsuda, Norihiro Tateda, Sei Otaka, Shusaku Akiba, Keisuke Saito, Tokuo Yodo, Mamoru Yoshimoto, Buffer-enhanced room-temperature growth and characterization of epitaxial ZnO thin films Applied Physics Letters. ,vol. 86, pp. 231911- ,(2005) , 10.1063/1.1947378
Kazuhiro Tada, Masaaki Yasuda, Geng Tan, Yumiko Miyake, Hiroaki Kawata, Mamoru Yoshimoto, Yoshihiko Hirai, Atomic step patterning in nanoimprint lithography: Molecular dynamics study Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. ,vol. 29, pp. 06FC11- ,(2011) , 10.1116/1.3659712
Yumiko Miyake, Yasuyuki Akita, Hideo Oi, Masahiro Mita, Satoru Kaneko, Kohji Koyama, Kazuhiko Sunagawa, Kazuhiro Tada, Yoshihiko Hirai, Mamoru Yoshimoto, Nanoimprint Fabrication and Thermal Behavior of Atomically Ultrasmooth Glass Substrates with 0.2-nm-Height Steps Japanese Journal of Applied Physics. ,vol. 50, pp. 078002- ,(2011) , 10.1143/JJAP.50.078002
M. Yoshimoto, T. Maeda, T. Ohnishi, H. Koinuma, O. Ishiyama, M. Shinohara, M. Kubo, R. Miura, A. Miyamoto, Atomic‐scale formation of ultrasmooth surfaces on sapphire substrates for high‐quality thin‐film fabrication Applied Physics Letters. ,vol. 67, pp. 2615- 2617 ,(1995) , 10.1063/1.114313