The formation of titanium, chromium, niobium and zirconium aluminides in thin films for interconnections
作者： R.K Ball , A.G Todd
DOI: 10.1016/0040-6090(87)90390-7
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摘要: Abstract The formation of transition metal aluminides in thin film reaction couples was explored using X-ray diffraction and differential scanning calorimetry. Kissinger-Ozawa analysis applied to the calorimetry results yield information on kinetics reactions. indicate that metals from groups IV, V VI show a range interaction modes with aluminium these are modified significantly when copper is present as an alloying addition aluminium. These have important bearing selection for use interlayers electromigration-resistant interconnections or diffusion barriers.
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