Electromigration Interconnect Lifetime under AC and Pulse DC Stress
作者： B. K. Liew , N. W. Cheung , C. Hu
关键词:
摘要: A vacancy relaxation model which predicts the DC lifetime, pulse and AC lifetime for all waveforms frequencies above 10 kHz is proposed. The lifetimes of aluminum interconnect are experimentally found to be more than 10/sup 3/ times larger at same current density. stress have dependences on magnitude temperature, T >
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