Electron beam system
作者： Nobuharu Noji , Shoji Yoshikawa , Tohru Satake , Takeshi Murakami , Mamoru Nakasuji
DOI:
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摘要: Provided is an electron beam system, in which emitted from gun irradiated to a stencil mask, and the that has passed through mask magnified by lens then detected detector having plurality of pixels so as form image sample. Further provided primary directed sample surface prepared subject be inspected, formed secondary emanated detected, wherein NA aperture disposed path common both beam. An vicinity surface, this arrangement, crossover produced gun, may conjugate relationships relative each other with respect
lens.org 参考文章(16)
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