作者: Nor Damsyik Mohd Said , Mohd Zainizan Sahdan , Nafarizal Nayan , Hashim Saim , Feri Adriyanto
DOI: 10.1039/C8RA03950J
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摘要: In this research, pure titanium dioxide (TiO2) and doped TiO2 thin film layers were prepared using the spin coating method of titanium(IV) butoxide on a glass substrate from sol–gel annealed at 500 °C. The effects structural chemical properties these films then investigated. metal which exists as trivalent electrons consists aluminium (Al), yttrium (Y) gadolinium (Gd). anatase phase was observed it found that crystal size became smaller when concentration increased. grain to be 0.487 13.925 nm. types surface morphologies nanoporous, with little agglomeration nanoparticles corresponding Al TiO2, Y Gd respectively. doping increased rising thickness film. This can contribute defects give advantages mobility hole carriers is high Ti move easily. Thus, Ti3+ existed defect state in based lattice distortion faster growth encouraged formation higher level oxygen vacancy defects.