Chemical stripping of ceramic films of titanium aluminum nitride from hard metal substrates
作者： Daniele Bonacchi , Gabriele Rizzi , Ugo Bardi , Andrea Scrivani
DOI: 10.1016/S0257-8972(02)00720-X
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摘要: We report here the result of a study different chemical stripping methodologies for ceramic coatings deposited by PVD on hard metal substrates. show that an approach based system surface science techniques leads to possibility developing effective methods as well guidelines improving process. will about two tested layers titanium aluminum nitride (TINALOX) Physical Vapor Deposition (PVD) The were (i) combination hydrogen peroxide and potassium oxalate in alkaline conditions, (ii) permanganate concentrated sulfuric acid solution. Of methods, second (permanganate acid) appears be most promising, although further studies needed optimize
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