Study of initial stages of thin film growth by means of atomistic computer simulation and image analysis: Comparison with experimental data

摘要: Abstract The initial stages of metal film growth were studied by computer experiment. structures generated an atomistic model combining the molecular dynamics and Monte Carlo approaches analysis obtained was performed image processing algorithms. Film morphology tested several methods it found that especially Voronoi tessellation Quadrat Counts are best suited for a description spatial distribution objects. same morphological applied to experimental data – micrographs discontinuous films Ag, Au In grown on dielectric or graphite substrates. It small evaporation rates is in good agreement with experiments. However, when increasing effect secondary nucleation starts be pronounced discrepancy between modelled experimentally derived results occurs. This demonstrated indium intensive nucleation.