Blank for alternating PSM photomask with charge dissipation layer
作者： Christophe Pierrat
DOI:
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摘要: A conductive blank enables election beam (e-beam) patterning rather than optical for the phase level etch of a phase-shifting mask (PSM) photomask. The includes layer between chrome (pattern) and quartz substrate. is patterned with in-phase phased features, then recoated resist layer. An e-beam exposure tool exposes over features. still intact under dissipates any charge buildup in during this process. etches through creates pocket quartz. subsequent isotropic both features removes at improves radiation transmission intensity. Alternatively, visually transparent can be used, eliminating need to
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