Characterization and properties of quaternary Mo–Si–C–N coatings synthesized by magnetron sputtering technique

摘要: Abstract In this paper the direct current unbalanced reactive magnetron sputtering and composite target techniques were exploited to deposit quaternary Mo–Si–C–N coatings on Si wafer stainless steel (1Cr18Ni9) in an Ar/N2 gaseous mixture. The chemical composition, microstructure, morphology, hardness, friction coefficient of these films characterized by means X-ray diffraction, XPS, field emission scanning electron microscopy, TEM nanoindentation. With increase C content range C/(C + Mo + Si + N) = 0–12 at.%, crystallite size decreases from 32 nm 5 nm average 0.24 0.17, while hardness increases at first then after passing a maximum value about 27 GPa 9 at.% C. It was suggested that atoms substitute for N nano-sized crystalline Mo2N form Mo2N(C) solid solution phase microstructure may be embedded amorphous SiNx CNx phases.