Active matrix substrate and display device equipped with the same
作者： Kenji Nakamura , Wataru Nakamura , 美広 岡田 , 健志 仲村 , Yoshihiro Okada
DOI:
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摘要: PROBLEM TO BE SOLVED: To provide an active matrix substrate reducing capacitance formed in the intersection of a scanning line and signal without increasing wiring resistance decreasing driving capability switching element, also to display device equipped with same. SOLUTION: The invention comprises; 10, 11 which is on 10; 13 intersects 11; thin film transistor 14 operates response applied pixel electrode 15 electrically connected via 14. lines composed conductive layer different from source 14S drain 14D inter-layer insulating 12 covering contact hole 12' provided 12. COPYRIGHT: (C)2006,JPO&NCIPI
lens.org 参考文章(9)
Shigeru Nobe, Hiroyuki Morishima, Kazuhiro Enomoto, Takenori Narita, Nobuko Terada, Haruaki Sakurai, 和宏 榎本, 武憲 成田, 治彰 桜井, 信子 寺田, 浩之 森嶋, 茂 野部, Silica-based film, method of forming silica-based film, and electronic component having silica-based film ,(1999)
Yuichi Saito, Hisashi Nagata, Yoshihiro Izumi, 尚志 永田, 良弘 和泉, 裕一 齊藤, Active matrix substrate, manufacture thereof, and flat panel image sensor ,(1999)
Teruhiko Ichimura, Hideaki Takizawa, Satoru Kawai, Atsushi Inoue, Norio Nagahiro, Thin film transistor matrix ,(1990)
Noriko Yamada, Shingo Katayama, 真吾 片山, 郁子 吉永, Ikuko Yoshinaga, 紀子 山田, Insulation film and coating liquid for forming the same ,(1996)
Harada Hideki, Nagashima Takashi, FORMING METHOD OF SEMICONDUCTOR DEVICE INSULATING FILM ,(1994)
Hinata Shoji, Aruga Yasuhito, Tsuyuki Tadashi, ELECTROPTICAL DEVICE AND ELECTRONIC DEVICE ,(2003)
Azuma Nobuyuki, Iwamatsu Tadashi, Hirakawa Hiroyuki, Muto Yoshinori, DISPLAY DEVICE AND ITS MANUFACTURING METHOD ,(2004)
Kenkichi Suzuki, Ryoji Oritsuki, Kazuo Shirohashi, Hideaki Taniguchi, Manufacture of liquid crystal display device ,(1988)
Shunpei Yamazaki, 舜平 山崎, Semiconductor device and manufacture of semiconductor device ,(1999)