Resolution Capabilities of Chromatic Sensing in the Monitoring of Semiconductor Plasma Processing Systems
作者： R.J. YU , P.J.G. LISBOA , P.C. RUSSELL , G.R. JONES
DOI: 10.1080/02780899708953038
关键词:
摘要: An on-line monitoring system for semiconductor plasma processing systems, based on the chromatic of emission spectra a has been developed. The offers low cost operation, lack interference with and fast response. Previous work shown that signature is good indicator quality final product. In this contribution an analysis signal-to-noise performance presented. It because their integrative nature, offer higher ratio than comparable optical systems. These results provide further evidence suitable control
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