Auger and X-ray photoelectron spectroscopic and electrochemical characterization of titanium thin film electrodes
作者： Neal R. Armstrong , Rod K. Quinn
DOI: 10.1016/0039-6028(77)90007-3
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摘要: Abstract Auger (AES) and X-ray photoelectron spectroscopic (XPS) characterizations of electrochemically oxidized titanium are described. Surface oxides on thin (200–250 A) vacuum deposited films were formed under conditions linear potential scan in 1 N KClO4, HClO4 H2SO4. Current/voltage, capacitance/voltage surface conductance/voltage relationships confirmed the irreversible formation oxide at thickness 20–30 A/V, for low applied potentials. Post moretem analysis by AES XPS indicated a mixture metal (TiO2, Ti2O3, TiO) each surface, with higher states predominating films. Observation LIIIM2,3M4,5, N(E) signal shape spectra potentially showed suboxide TiO-like rather than an TiO2 state. Deconvolution Ti (2 p 2 , 3 ) coexistence multiple oxidation during electrochemical or atmospheric Ion sputtering was used to characterize subsurface metal/metal composition correlate oxygen atomic ratio pretreatment.
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