Thermal Change of Unstable Stacking Faults in β-SiC

作者: Naoto Shirahata , Kazunori Kijima , Xiuliang Ma , Yuichi Ikuhara

DOI: 10.1143/JJAP.40.3969

关键词:

摘要: The thermal change of unstable stacking faults (USFs) in ultrafine and highly pure β-SiC powder synthesized by the plasma chemical vapor deposition (plasma-CVD) method was studied high-resolution transmission electron microscopy (HR-TEM). number USFs, which were frequently observed as-synthesized powder, decreased at elevated temperatures an Ar atmosphere. In contrast, general (GSFs) increased with decreasing USFs. Moreover, a type fault that geometrically more than USF specimen after heat treatment. present study, annihilation process USFs before treatment is discussed.

参考文章(2)
Naoto Shirahata, Kazunori Kijima, Xiuliang Ma, Yuichi Ikuhara, A New Type of Stacking Fault in β-SiC Japanese Journal of Applied Physics. ,vol. 40, pp. 505- 508 ,(2001) , 10.1143/JJAP.40.505
J. Takahashi, Noboru Ohtani, Masakazu Katsuno, S. Shinoyama, Influence of the Growth Direction and Polytype on the Stacking Fault Generation in α-SiC Materials Science Forum. pp. 25- 28 ,(1998) , 10.4028/WWW.SCIENTIFIC.NET/MSF.264-268.25