Permeation barrier for encapsulation of devices and substrates

作者: Ruiqing Ma , Jeffrey Silvernail , Prashant Mandlik

DOI:

关键词:

摘要: A permeation barrier film structure for organic electronic devices includes one or more bilayers having a hybrid composition. Each of the first region composition corresponding to CF 4 -O 2 Plasma Reactive Ion Etch Rate and second Rate, wherein is greater than by factor 1.2 homogeneous mixture polymeric material non- material, created from single precursor material.

参考文章(31)
Sukekazu Aratani, Yoshiyuki Kaneko, Yuichi Sawai, Tomoji Oishi, Film for organic EL device and an organic EL device using the film ,(2001)
Ruiqing Ma, Jeffrey A. Silvernail, Prashant Mandlik, Sigurd Wagner, Julia J. Brown, Lin Han, Hybrid layers for use in coatings on electronic devices or other articles ,(2007)
Louis L. Hsu, Lawrence A. Clevenger, Kwong Hon Wong, Li-Kong Wang, Tricia L. Breen, Polymer thin-film transistor with contact etch stops ,(2003)
Michael Stuart Weaver, Jeffrey Alan Silvernail, Protected organic optoelectronic devices ,(2001)
Kenshi Kanegae, Hideo Nakagawa, Shinichi Imai, Etching method, semiconductor and fabricating method for the same ,(2001)
Eric Sidney Mast, Gordon Lee Graff, Michael Gene Hall, Mark Edward Gross, Ming Kun Shi, Peter Maclyn Martin, Method of making encapsulated display devices ,(2002)
Stephen Forrest, Paul Burrows, Organic optoelectronic device structures ,(2002)