Substrate table, production method therefor and plasma treating device
作者： Shinji Muto , Chihiro Taguchi , Nobuyuki Okayama
DOI:
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摘要: The susceptor of a plasma treating device, or the electrostatic chuck substrate table, is formed by ceramic thermal spray method. A thermally sprayed layer pore-sealed methacrylic resin. Resin raw material mainly containing methyl methacrylate applied to and impregnated into then cured thereby fill pores between particles in with Methacrylic resin solution, which does not produce at curing, can complete perfect pore sealing.
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