Controlled Sr release from Ti–Sr–O films deposited by non-reactive magnetron sputtering in an industrial setup

摘要: Abstract Titanium implants comprising strontium (Sr) are considered to have a large clinical potential due the ability of Sr stimulate bone formation and inhibit resorption, thereby accelerating osseointegration. In this work, Ti–Sr–O films were synthesized by non-reactive DC magnetron co-sputtering from pure Ti target composite Ti–SrTiO 3 (50/50 wt.%) in an industrial-scale coating unit. Depositions either carried out with different relative powers on two targets fixed sputter-gas pressure target-to-substrate distance or at pressures distances powers. The demonstrated capability releasing when submerged into phosphate-buffered saline solution, as evidenced inductively coupled plasma atomic emission spectroscopy. Furthermore, amount rate released could be controlled means incorporated during film synthesis through control topography/morphology, specifically effective surface area, films. Generally, highest contents exhibiting open columnar structure amounts solution. Structural characterization X-ray diffraction transmission electron microscopy revealed that contained small TiO x nanocrystals (~ 5 nm) embedded amorphous matrix. amorphous-phase fraction increased increasing content well deposited higher pressures. Films high further developed more morphology, resulting release. presented findings may ultimately used introduce coated designed Sr-release profiles for dental orthopedic applications.