XPS study of the adsorption of ethoxysilanes on iron
作者： R. Bailey , J. E. Castle
DOI: 10.1007/BF00561978
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摘要: The uptake by polished iron surfaces of two R-ethoxysilanes, used commercially as adhesion promoters, has been studied XPS. It is concluded that the presence an active group in organic radical may influence uptake. However, unsuspected impurities solvent preparation test media also had important effect. Subsidiary data on adsorption butylamine from gas phase which yield values for escape depth electrons materials are reported.
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