Oxidation of organic films by beams of hydroxyl radicals.

作者: Timothy M. D'Andrea , Xu Zhang , Evan B. Jochnowitz , T. G. Lindeman , C. J. S. M. Simpson

DOI: 10.1021/JP7096108

关键词:

摘要: We have studied the oxidation of self-assembled monolayers (SAMs) alkanes and alkenes with a thermal beam OH radicals. The target films were produced by bonding alkane thiols alkene to gold surface SAMs are mounted in vacuum chamber at base pressure 10-9 Torr. Hydroxyl radicals corona discharge an Ar/H2O2/water mixture. resultant molecular was scanned electrostatic hexapole [4 (+/- 1) x 1011 cm-2 sec-1] focused onto SAM. All hydroxyl impinging on SAM rotationally (J' '

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