Cooled mirror for a double undulator beamline.

摘要: The design of a contact-cooled horizontally reflecting high-heat-load mirror for use as the first optical element on an Advanced Photon Source (APS) beamline is described. radiation source consists set two collinear undulators producing x-ray beam with up to 340 W/mm2 peak normal heat flux at located 30 m from source. incident angle 2.6 mrad (0.15°). 500 mm long and 75 wide. Specifications this are rms tangential slope error ≤ 2 μrad roughness a. substrate single crystal silicon. To selectively reflect photons cut-off energies in 7 33 keV range, central part may be coated strips Rh, Pt, Be. Thermal structural analyses (steady state transient) reported. Two contact-cooling options considered back side cooling. cooling smaller than that influence of the thickness zone analyzed. Other reduce discussed.